GaAs/AlGaAs multiple quantum well structures containing an nipi delta-doping superlattice, where the n-type doping is inserted in the quantum wells and the p-type in the barriers, have been studied in detail to evaluate their potential for use in the fabrication of amplitude modulators. It is shown that C is an adequate p-type dopant for such structures, however, little exibility is found in the growth conditions, in particular for the V to III uxes ratio, for obtaining such layers. It is also observed that the required balance between n and p type doping levels is not trivial to be achieved due to the presence of interface hole traps whose population depends on the quantum well doping concentration. In addition, the observed photoluminescence near-edge emission at room temperature occurs at essentially the same energy as that of an equivalent undoped structure. Finally, no deep level emissions are observed which could deteriorate the device performance.

The interfaces in InP=In0.53 Ga0.47As superlattices modulation doped with Si were investigated using magneto-transport, capacitance-voltage, and high resolution X-ray diffraction measurements. Results indicate that a thick interfacial layer is formed when InP is grown on top of In xGa1-xAs, and that Si atoms that fall in the interfacial layer have a high probability of not forming a shallow donor center. Using a simple theoretical model the width of the interfacial layer which was estimated to be 7±1 monolayers.

Carbon doped AlInAs layers grown by low pressure metalorganic vapor phase epitaxy are investigated as a function of growth temperature. Photoluminescence spectra show a significant drop in peak intensity as the growth temperature is reduced, due to the incorporation of non-radiative defects. It is shown that the C doping is not related to the deterioration of the optical properties of the layers. On the other hand, both the net hole concentration and the conductivity increase as the growth temperature is reduced due to a more efficient C incorporation and a lower incorporation of the passivating H atoms.